DSpace
 

EPrints@IIT Delhi >
Faculty Research Publicatons  >
Physics >

Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/1129

Title: Continuous wave laser-induced temperature rise in the thin films of silicon nanocrystals using Raman scattering
Authors: Mavi, H S
Prusty, Sudakshina
Shukla, A K
Abbi, S C
Keywords: Nanostructures
Raman scattering
Photon emission
Silicon
Issue Date: 2003
Citation: Thin Solid Films, 425(1-2), 90-96
Abstract: Continuous wave (CW) laser-induced temperature rise is studied in Raman spectra of nanocrystalline-silicon (nC-Si) films on quartz and sapphire substrates. The zone-center-phonon (ZCP) mode in the Raman spectra shows remarkably different frequencies in the thin films as the incident CW laser power density is increased (always kept lower than that used during annealing). For the films on the quartz substrate, the prominent ZCP mode shows a rather large phonon softening from 517 to 485 cm−1. The phonon softening in the nC-Si film on sapphire substrate was from 517 to 508 cm−1. In order to see the role of laser heating, we have also computed the temperature rise in the two films by employing Green's function heat diffusion equations for the two-layered structures. We could ascribe the differences in laser-induced phonon softening in the two films to the rise in temperatures. Good agreement between temperatures obtained by Raman data and heat diffusion equation is achieved here.
URI: http://eprint.iitd.ac.in/dspace/handle/2074/1129
Appears in Collections:Physics

Files in This Item:

File Description SizeFormat
mavicon2003.pdf76.13 kBAdobe PDFView/Open
View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback