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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2074/1239
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| DC Field | Value | Language |
| contributor.author | Pandey, P T | - |
| contributor.author | Sharma, G L | - |
| contributor.author | Awasthi, D K | - |
| contributor.author | Vankar, V D | - |
| date.accessioned | 2006-01-24T06:15:52Z | - |
| date.available | 2006-01-24T06:15:52Z | - |
| date.issued | 2003 | - |
| identifier.citation | Vacuum, 72, 297–305 | en |
| identifier.uri | http://eprint.iitd.ac.in/dspace/handle/2074/1239 | - |
| description.abstract | Diamond thin films have been synthesized by hot-filament chemical vapor deposition process using a mixture of methane and hydrogen gases. The samples were subjected to very high-energy ion irradiation (100MeV Au7+ ions).The field emission characteristics of ion-irradiated samples have been studied. High emission currents and low turn-on and threshold fields were obtained for ion-irradiated samples. The as-deposited and the ion-irradiated samples have been characterized by X-ray Diffraction, Scanning Electron Microscopy and Micro-Raman Spectroscopy techniques
and the resulting changes are correlated with field emission results. | en |
| format.extent | 524852 bytes | - |
| format.mimetype | application/pdf | - |
| language.iso | en | en |
| subject | Diamond | en |
| subject | Chemical vapor deposition | en |
| subject | Field emission | en |
| subject | Ion irradiation | en |
| title | Field emission characteristics of high-energy ion-irradiated polycrystalline diamond thin films | en |
| type | Article | en |
| Appears in Collections: | Physics
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| pandeyfie2003.pdf | | 512Kb | Adobe PDF | View/Open |
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