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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/1285

Title: Radiation hardness of polycrystalline diamond thin films irradiated with 100 MeV I7+ ions
Authors: Dilawar, N
Kapil, R
Vankar, V D
Avasthi, D K
Kabiraj, D
Mehta, G K
Keywords: Chemical vapour deposition (CVD)
Ion bombardment
Radiation damage
Issue Date: 1997
Citation: Thin Solid Films, 305(1-2), 88-94
Abstract: Polycrystalline diamond thin films grown by hot-filament chemical vapour deposition (CVD) process were irradiated with 100 MeV I7+ ions. The as-deposited and irradiated films were characterized using micro-Raman spectroscopy, glancing angle X-ray diffraction (XRD), resistivity measurements and scanning electron microscopy (SEM) techniques. Defects and non-diamond carbon phases were seen to develop on irradiation up to a fluence of 1.3 × 1014 ions/cm2. The extent of damage to the films was found to be critically dependent on the crystalline quality of the film. The resulting changes were correlated with the hydrogen concentrations in the films as studied by elastic recoil detection analysis.
URI: http://eprint.iitd.ac.in/dspace/handle/2074/1285
Appears in Collections:Physics

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