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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/1285

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dc.contributor.authorDilawar, N-
dc.contributor.authorKapil, R-
dc.contributor.authorVankar, V D-
dc.contributor.authorAvasthi, D K-
dc.contributor.authorKabiraj, D-
dc.contributor.authorMehta, G K-
dc.date.accessioned2006-01-24T10:41:54Z-
dc.date.available2006-01-24T10:41:54Z-
dc.date.issued1997-
dc.identifier.citationThin Solid Films, 305(1-2), 88-94en
dc.identifier.urihttp://eprint.iitd.ac.in/dspace/handle/2074/1285-
dc.description.abstractPolycrystalline diamond thin films grown by hot-filament chemical vapour deposition (CVD) process were irradiated with 100 MeV I7+ ions. The as-deposited and irradiated films were characterized using micro-Raman spectroscopy, glancing angle X-ray diffraction (XRD), resistivity measurements and scanning electron microscopy (SEM) techniques. Defects and non-diamond carbon phases were seen to develop on irradiation up to a fluence of 1.3 × 1014 ions/cm2. The extent of damage to the films was found to be critically dependent on the crystalline quality of the film. The resulting changes were correlated with the hydrogen concentrations in the films as studied by elastic recoil detection analysis.en
dc.format.extent81870 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoenen
dc.subjectChemical vapour deposition (CVD)en
dc.subjectDiamonden
dc.subjectIon bombardmenten
dc.subjectRadiation damageen
dc.titleRadiation hardness of polycrystalline diamond thin films irradiated with 100 MeV I7+ ionsen
dc.typeArticleen
Appears in Collections:Physics

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