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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/2308

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dc.contributor.authorMehta, B R-
dc.contributor.authorOgryzlo, E A-
dc.date.accessioned2006-12-05T08:33:18Z-
dc.date.available2006-12-05T08:33:18Z-
dc.date.issued1993-
dc.identifier.citationDiamond and Related Materials, 3(1-2), 10-13p.en
dc.identifier.urihttp://eprint.iitd.ac.in/dspace/handle/2074/2308-
dc.description.abstractModifications have been incorporated in the conventional microwave-assisted chemical vapour deposition process to deposit diamond-like carbon (DLC) coatings on polycarbonate substrates. In the modified method, the substrates to be coated are placed outside the plasma chamber. An electric field is applied across the microwave discharge. The accelerated ionic species leave the nozzle and bombard the substrates placed in a separate chamber. Using the present technique, DLC films have been deposited on silicon and polycarbonate substrates. These films show chemical inertness and hardness values in the range 15–19.5 GPa.en
dc.format.extent141321 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoenen
dc.subjectdiamond-like carbonen
dc.subjectpolycarbonateen
dc.subjectionic speciesen
dc.subjectnozzle and bombarden
dc.subjectsilicon and polycarbonateen
dc.subject15–19.5 GPaen
dc.titleRoom-temperature deposition of diamond-like carbon films by the microwave plasma jet methoden
dc.typeArticleen
Appears in Collections:Physics

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