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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/2395

Title: Process and material properties of WSi2 formed by discharge treatment
Authors: Singh, Awatar
Vyas, P D
Khokle, W S
Singh, C
Lal, K
Keywords: material properties
WSi2
discharge treatment
Issue Date: 1993
Citation: Solid-State Electronics, 36(9), 1365-1367p.
URI: http://eprint.iitd.ac.in/dspace/handle/2074/2395
Appears in Collections:Industrail Tribology Machine Dynamics [ITMMEC]

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