EPrints@IIT Delhi >
Faculty Research Publicatons  >
Physics >

Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/286

Full metadata record

DC FieldValueLanguage
dc.contributor.authorSrinivas, G-
dc.contributor.authorVankar, V D-
dc.identifier.citationMaterials research bulletin,31(11),1331-1340en
dc.description.abstractSystematic ellipsometric studies of MoSia tetragona1) thin films formed by RTA processing of cosputtered Mo25&i75, Mo30Si70 and Mo36&i64 thin films are discussed. The optical properties of these films in the measured spectral range 1.3-5.3 eV were observed to be dominated by the microstructural variations such as due to the changes in density, oxide overlayer thickness and composition, surface roughness, and redistribution of available excess silicon (after formation of MoSiz (tetragonal) phase). These microstructural variations indicated modification of interfaces and significant change in conductivity, which were corroborated in the AES depth profiles and the electrical resistivity measurements.en
dc.format.extent689395 bytes-
dc.subjectthin filmsen
dc.subjectoptical propertiesen
dc.titleEllipsometric studies of polycrystalline molybdenum silicide thin filmsen
Appears in Collections:Physics

Files in This Item:

File Description SizeFormat
srinivasell.pdf673.24 kBAdobe PDFView/Open
View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.


Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback