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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/320

Title: Microstructural studies of molybdenum silicide thin films by spectroscopic ellipsometry
Authors: Srinivas, G
Vankar, V D
Keywords: Molybdenum silicide
Thin films
Silicon substrates
RTA annealing
Spectroscopic ellipsometry
Microstructural modelling
Effective medium approximation
Issue Date: 1997
Citation: Materials Letters, 30(1), 35-40
Abstract: Thin films of compositions Mo,,Si,, and Mo,,Si,, were co-sputtered onto p-type silicon substrates and annealed using a rapid thermal annealing system. The spectroscopic ellipsometric studies were performed on samples which crystallized into the most stable MoSi, tetragonal phase. The Bruggeman effective medium theory in a multiphase-multilayer mode was used to determine the microstructural details of these films. The microstructural modelling results indicated varied fractions of silicon and voids randomly mixed in the matrix of MoSi a. It was also observed that the composition of the SiO,overlayeralso varied with changes in the annealing temperature and was found to depend on the starting composition.
URI: http://eprint.iitd.ac.in/dspace/handle/2074/320
Appears in Collections:Physics

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