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Please use this identifier to cite or link to this item: http://eprint.iitd.ac.in/handle/2074/628

Title: Mirage-effect-based depth profiling of micromachined silicon structures
Authors: Tuli, Suneet
Bhattacharyya, Amalendu B
Forget, Benoit C
Fournier, Daniele
Keywords: Depth profiling
Micromachining
Mirage effect
Silicon
Issue Date: 1998
Citation: Sensors and actuators A, 64(3), 203-207
Abstract: A contact,non-destructive techique for the depth profiling of micromachined structures is presented.Based on the mirage or optical beam deflection method of photothermal spectrosocpy, an expremental measurement of a 8p.m step in silicon is given by way of illustration.
URI: http://eprint.iitd.ac.in/dspace/handle/2074/628
Appears in Collections:Applied Research in Electronics [CARE]

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