भारतीय प्रौद्योगिकी संस्थान दिल्ली
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Characterization of Hg-sensitized photo chemical vapour deposited silicon oxide and silicon oxynitride thin films.

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Author: Kumar, Vipan

Advisor: Agnihotri, O.P.; Vankar, V.D.; Chari, K.S.

Date: 1994

Publisher: IIT Delhi

Citation:
Series/Report no.: TH-2125;

Item Type: Thesis

Keywords: Keywords

Abstract:
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Shankar B. Chavan
Computer Applications Division
Central Library, IIT Delhi
shankar.chavan@library.iitd.ac.in
NDLTD
Shodhganga
NDL
ePrints@IISc
etd@IISc
IR@IIT Bombay
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Shankar B. Chavan
Computer Applications Division
Central Library, IIT Delhi
shankar.chavan@library.iitd.ac.in
NDLTD
Shodhganga
NDL
ePrints@IISc
etd@IISc
IR@IIT Bombay
NewsClips @IITD
  • Facebook
  • twitter
  • youtube
  • instagram
  • pinterest
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