Characterization of Hg-sensitized photo chemical vapour deposited silicon oxide and silicon oxynitride thin films.

dc.contributor.advisor	Agnihotri, O.P.
dc.contributor.advisor	Vankar, V.D.
dc.contributor.advisor	Chari, K.S.
dc.contributor.author	Kumar, Vipan
dc.date.accessioned	2015-04-06T07:29:45Z
dc.date.accessioned	2019-02-10T13:23:38Z
dc.date.accessioned	2019-02-11T05:58:44Z
dc.date.available	2015-04-06T07:29:45Z
dc.date.available	2019-02-10T13:23:38Z
dc.date.available	2019-02-11T05:58:44Z
dc.date.issued	1994
dc.identifier.other	532.6 VIP-C
dc.identifier.uri	http://localhost:8080/iit/handle/2074/4109
dc.language.iso	en	en_US
dc.publisher	IIT Delhi
dc.relation.ispartofseries	TH-2125;
dc.title	Characterization of Hg-sensitized photo chemical vapour deposited silicon oxide and silicon oxynitride thin films.	en_US
dc.type	Thesis	en_US