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Properties of RF plasma grown Al2O3 and Aln insulators on silicon and effect of plasma annealing on thermally grown SiO2 films

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Author: Chandra, Sudhir

Advisor: Bhattacharyya, A.B.

Date: 1980

Publisher: IIT Delhi

Citation:
Series/Report no.: TH-724;

Item Type: Thesis

Keywords: Keywords

Abstract:
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Shankar B. Chavan
Computer Applications Division
Central Library, IIT Delhi
shankar.chavan@library.iitd.ac.in
NDLTD
Shodhganga
NDL
ePrints@IISc
etd@IISc
IR@IIT Bombay
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Shankar B. Chavan
Computer Applications Division
Central Library, IIT Delhi
shankar.chavan@library.iitd.ac.in
NDLTD
Shodhganga
NDL
ePrints@IISc
etd@IISc
IR@IIT Bombay
NewsClips @IITD
  • Facebook
  • twitter
  • youtube
  • instagram
  • pinterest
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