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  • Strain studies in LPCVD polysilicon for surface micromachined devices 

    Singh, Janak; Chandra, Sudhir; Chand, Ami (1999)
    Polycrystalline silicon polysilicon has emerged as a preferred material for surface micromachined MEMS applications because of its compatibility with standard CMOS process. The important parameters of polysilicon films for ...